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工艺综合及其在MOSFET和双极器件中的应用
Process Synthesis and Its Application to MOSFET’s and Bipolar Devices
【摘要】 工艺综合是一种自顶向下的工艺、器件设计方法。文章通过应用于MOS器件和双极型器件的工艺与器件设计,介绍工艺综合并验证工艺综合思想;介绍了基于工艺综合开发的MO-SPAD软件系统。在工艺综合系统中,使用响应表面法可加速综合的速度。
【Abstract】 Process synthesis is a new method for designing device and process, with which the topdown idea could be realized This paper illustrates the process synthesis methodology by applying the method to the design of MOSFET’s and bipolar devices A software system, MOSPAD, based on the process synthesis methodology, has been developed Response Surface Method (RSM) is used in MOSPAD, which speeds up the synthesis
【关键词】 工艺综合;
MOSFET;
双极器件;
响应表面法;
【Key words】 Process synthesis; MOSFET; Bipolar device; Response surface method;
【Key words】 Process synthesis; MOSFET; Bipolar device; Response surface method;
- 【文献出处】 微电子学 ,Microelectronics , 编辑部邮箱 ,2003年01期
- 【分类号】TN405
- 【下载频次】38