【摘要】 用磁过滤电弧制备了ZrN和ZrN TiN多层膜 ,磁控溅射制备了ZrN薄膜。结果表明 ,ZrN TiN多层膜 ,由于纳米多层化作用 ,硬度高于ZrN和TiN的 2 6GPa和 2 1GPa,平均值达到 34 5GPa。X射线衍射分析表明 ,ZrN TiN多层膜由ZrN和TiN组成。过滤电弧制备的ZrN和ZrN TiN多层膜的结合力为 81N和 77N ,磁控溅射制备的ZrN薄膜的结合力为 2 6N。极化曲线的结果显示 ,过滤电弧制备的ZrN和ZrN TiN多层膜的耐腐蚀性显著优于磁控溅射制备的ZrN薄膜 ,讨论了两种方法制备薄膜性能差异的原因。更多还原

【Abstract】 The properties and corrosion-resistant of ZrN and its multilayer films deposited using the filtering arc and magnetic sputtering are investigated. It is shown that the hardness of ZrN multilayer films is higher than one of ZrN (26GPa) and TiN (21GPa), and the average hardness of multilayer films is up to 34.5GPa. ZrN/TiN multilayer films consist of ZrN and TiN phase. The adhesion of filtering arc deposited ZrN and ZrN/TiN multilayer films are 87N and 77N respectively. The adhesion of magnetic sputtering deposited ZrN film is only 26N. The polarization curves of ZrN and ZrN/TiN multilayer films are examined. It shows that corrosion-resistant of filtering arc deposited ZrN and ZrN/TiN multilayer films is prior to magnetic sputtering deposited ZrN film obviously. The reasons of properties deference in two methods deposited films are discussed.更多还原