【摘要】 研究了氧掺杂Ge Sb Te磁控溅射相变薄膜在 4 0 0～ 80 0nm区域的光学常数 (n ,k) ,发现不同氧成分薄膜的光学性质有较大差别 ,经过热处理后薄膜的光学性质也发生了较大变化。由热处理前后薄膜的X射线衍射 (XRD)发现 ,经过退火处理后薄膜发生了从非晶态到晶态的相变。由薄膜内应力变化和薄膜的结构变化解释了薄膜光学性质的变化更多还原

【Abstract】 Optical properties of oxygen-doped Ge-Sb-Te thin films prepared by RF-sputtering method in the region of 400～800 nm were studied, including refractive index, extinction coefficient. The results show that optical constants of the Ge-Sb-Te-O films change with oxygen content and heat-treatment. XRD spectra of the films with different oxygen content in the as-deposited and heat-treated states show that the films changed from amorphous to crystalline states due to heat-treatment. The effect of the strain field induced by oxygen-doping on optical properties is discussed.更多还原