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扫描速率对硅表面分子沉积膜纳米摩擦特性的影响

Effect of scan rate on nonafriction properties of monolayer molecular deposition film on silicon

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【作者】 高芒来聂时春张嗣伟

【Author】 GAO Manglai1,NIE Shichun2,ZHANG Siwei3 (1.Faculty of Chemical Engineering, University of Petroleum,Beijing 102249,China; 2.Great Wall Lubricationg Oil Group CO.,SINOPEC,Beijing 100085,China; 3.College of Mechanical & Electronic Engineering, University of Petroleum,Beijing 102249,China)

【机构】 石油大学化工学院中国石化长城润滑油集团有限公司石油大学机电学院 北京 102249北京 100085北京 102249

【Abstract】 The change of frictional force was studied with the increase of scan rate on different Si surface by atomic force microscopy.The results showed that frictional force had different effect with the increasement of scan rate on different surface.To Si surface and hydroxylate silicon surface,it became bigger.It first decreased and then increased on aminopropylsilanixed(APS)silicon surface,taking on conic section relation.It declined on monolayer copper phthalocyaninetetrasulfonic,tetrasodium salt(CuTsPc)molecular deposition film.In the process of scan,frictional heat greatly affected friction and may even change the shape of the film so that plastic flow arouse.

【基金】 国家自然科学基金资助项目(50175076);重质油加工国家重点实验室开放课题(2002-05)
  • 【文献出处】 化学研究与应用 ,Chemical Research and Application , 编辑部邮箱 ,2003年05期
  • 【分类号】O613.72
  • 【被引频次】6
  • 【下载频次】80
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