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新型低聚噻吩衍生物的设计、合成及其液晶性能的研究

Synthesis and Liquid Crystal Properties of a Novel Class of Oligothiophene Derivatives

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【作者】 刘平周小平胡建华赵其中邓文基童真许运华万梅香

【Author】 LIU, Ping , a ZHOU, Xiao Ping a HU, Jian Hua a ZHAO, Qi Zhong a DENG, Wen Ji b TONG, Zhen a XU, Yun Hua b WAN, Mei Xiang c ( a Research Institute of Materials Science, b Department of Applied Physics, South China University of Technology, Guangzhou 510640) ( c Institute of Chemistry, Chinese Academy of Sciences, Beijing 100080)

【机构】 华南理工大学材料所华南理工大学应用物理系中国科学院化学研究所 广州510640广州510640北京100080

【摘要】 设计、合成了一系列新型低聚噻吩衍生物N ,N′ 双烷烃基 5 ,5″ 二溴基 2 ,2′ :5′ ,2″ 三噻吩 4,4″ 二酰胺 [N ,N′ dialkyl 5 ,5″ dibromo 2 ,2′ :5′ ,2″ terthiophene 4,4″ dicarboxamide] (DNCnDBr3T ,n =5 ,8,16,18) .示差扫描量热法 (DSC)测定的结果及偏光光学显微镜观察的结果显示 ,DNC18DBr3T ,DNC16DBr3T ,DNC8DBr3T具有近晶A形液晶性质 ,DNC5DBr3T不具有液晶性质 .为了探讨分子间氢键对液晶形成的影响 ,设计、合成了新型低聚噻吩衍生物 4,4″ 双烷烃酯 5 ,5″ 二溴基 2 ,2′ :5′ ,2″ 三噻吩 [4,4″ bis(alkyloxycarbonyl) 5 ,5″ dibromo 2 ,2′ :5′ ,2″ terthiophene] (DOCnDBr3T ,n =5 ,8,16,18) .测定和观察的结果发现 ,DOCnDBr3T (n =5 ,8,16,18)不具有液晶的性质 .这个结果表明 ,酰胺基的存在对于液晶的形成起着重要的作用 .测定DNC18DBr3T在结晶状态和液晶状态下的红外光谱 ,进一步证实了部分分子间氢键对于液晶的形成起着重要的作用

【Abstract】 With the aim of developing new oligothiophene based liquid crystals involving hydrogen bonding, new terthiophene derivatives containing an alkylamide group, N,N′ dialkyl 5,5″ dibromo 2,2′:5′,2″ terthiophene 4,4″ dicarboxamide (DNC n DBr3T, n =5, 8, 16, 18), were designed and synthesized, and their thermal behaviors were examined. While DNC n DBr3T compounds with n =8, 16, 18 were found to form smectic A phase, DNC 5DBr3T did not form liquid crystal phase. In addition to liquid crystal behavior, crystal polymorphism was also observed for DNC 16 DBr3T . It is shown that the alkyl chain length greatly affects liquid crystal phase formation. The absence of liquid crystallinity in the corresponding ester derivatives suggests that intermolecular hydrogen bonding plays a role in the formation of liquid crystal phase in the DNC n DBr3T system.

【基金】 教育部留学回国人员科研启动基金;科技部基础研究重大项目前期研究专项 (No.2 0 0 1 CCA0 350 0 );人事部留学人员科技活动项目择优资助
  • 【文献出处】 化学学报 ,Acta Chimica Sinica , 编辑部邮箱 ,2003年05期
  • 【分类号】O633
  • 【被引频次】13
  • 【下载频次】456
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