【摘要】 为了比较研究Y、Ce离子注入对Zr-4合金氧化性能的影响,探索离子注入后的改性机制,对Zr-4合金表面分别注入了不同剂量的两种离子并在500℃条件下进行空气氧化。氧化曲线表明:Y、Ce离子注入均能明显改善Zr-4合金的氧化性能,改善的程度随注入剂量的提高而增大;Ce离子注入后的改性效果略强于Y。使用XPS、GAXRD研究了注入样品高温氧化实验后的表层氧化膜成份及其相结构,探讨了Y、Ce离子注入提高Zr-4合金高温抗氧化性能的机理。更多还原

【Abstract】 To study the effect of Y/Ce implantation on the oxidation behaviors of zircaloy-4, and investigate the mechanism of improvement of oxidation behavior for implanted zircaloy-4, Y and Ce ions were subjected to the Zr-4 samples at the different doses respectively, and the oxidation measurements were carried out at the temperature of 500℃ in the air. It was obviously found that a significant improvement was achieved in the oxidation behavior of zircaloy-4 samples implanted with Y or Ce, and more improvement was achieved for Ce-implanted Zr-4 than for Y-implanted Zr-4. X-ray Photoemission Spectroscopy (XPS) and Glancing Angle X-ray Diffraction (GAXRD) were employed to analyze the valence of the scales and the phase transformation in the oxide films. Finally, the mechanism of the improvement of the oxidation behavior was discussed.更多还原