【摘要】 研究了膜层厚度对锆合金基体上制备的直流磁控溅射铬膜附着性的影响。用扫描电镜观察了界面形貌,用原子力显微镜观察了膜层表面形貌,用能谱仪测定了界面成分,用划痕法测定了铬膜的附着性。结果表明:膜/基界面结合良好,界面上存在成分梯度,成分升降区狭窄;随着铬膜厚度从0.5μm增加到 2.0μm,晶粒迅速长大、致密的细纤维状组织的端面出现拱形,铬膜层附着性降低约50%;但铬膜厚度达1.0μm后,晶粒长大的速度和铬膜附着性下降的速度同时趋缓,表明铬膜的附着性与其晶粒大小有明显关系。膜层厚度增加引起膜层附着性下降的主要原因是由于厚度增加所带来的膜层组织及力学性能变化和膜层应力增加。更多还原

【Abstract】 To use chromium thin films to improve the properties of zircalog, some effects of its thickness have been studied. The interface of Cr/Zr was studied by means of scanning electron microscope (SEM), the composition of the interfaces was identified by an energy dispersive spectrum of X-ray (EDX), the grain morphology of film surfaces were observed by using atomic force microscope (AFM), scratch adhesion tests were performed on a WS-97 Automatic Scratch Tester to examine the adhesion of chromium films to its substrate. The results show that interface of Cr/Zr is well-knit and that there are composition gradient within a narrow region, though there is visible boundary. As the thicknesses of chromium films increase from 0.5μm to 2μm, its grain sizes remain less than microns but grow rapidly, the compact fine-fibre grains become the ones with vaulted top. The scratch tests also demonstrate that the bond strength decreases about 50% between chromium films and their substrates. When the thickness of chromium films is up to 1μm, the rates of grain growing and adhesion degrading slow down synchronously, which indicates that the adhesion of chromium films relates with its grain sizes. The adhesion degrades while the film thickness increases, mainly because that the increased thickness changes the film structure and the performance, and increases the film stress.更多还原