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亚波长消反射光栅
Design and Fabrication of Subwavelength Antireflection Gratings
【摘要】 为了降低消反射光栅的偏振敏感性 ,将等效介质理论推广到二维亚波长结构 ,对一种特定的矩形柱状结构进行了分析。构造了一种分析方法 ,然后利用光栅结构的有关表达式得到这种二维结构的近似等效系数。并设计了适用于 10 .6 μm红外波段的二维亚波长消反射光栅 ,用二元光学的制作工艺在Si衬底上进行了实验制备。测试结果表明 :对中心波长为 10 .6 μm的红外光 ,这种光栅象单层消反射膜一样 ,具有很好的增透效果。
【Abstract】 To reduce the polarization sensitivity of antireflection gratings, a particular rectangular structure was analyzed by genexating equivalent medium theory (EMT) to two-dimensional subwavelength structure. An approximate equivalent coefficient for two-dimensional subwavelength was obtained with the related expressions of grating structure. A two-dimensional subwavelength antireflection grating designed for 10.6 μm was fabricated on a Si substrate by using binary optical processing. The results show that this grating structure was similar to a single antireflection film at 10.6μm.
【Key words】 binary optics; equivalent medium theory; two-dimensional grating; subwavelength structure;
- 【文献出处】 光学学报 ,Acta Optica Sinica , 编辑部邮箱 ,2003年11期
- 【分类号】O436
- 【被引频次】31
- 【下载频次】377