【摘要】 提出一个利用多层膜小角X射线衍射谱衍射峰积分强度计算多层膜界面粗糙度的公式。用磁控溅射技术制备Mo/Si多层膜 ,用波长为 0 .15 4nm的硬X射线测量样品在小掠入射角区的衍射曲线 ,分别用本文公式和反射率曲线拟合方法计算了样品的界面粗糙度。实验结果表明 :由本文公式获得的界面粗糙度近似于拟合方法获得的界面粗糙度 ,它们略等于多层膜界面实际粗糙度更多还原

【Abstract】 A simple formula for calculating the interfacial roughness of multilayer by using the small angle X ray diffraction curves of the samples is given. The Mo/Si multilayer is prepared by using the magnetron sputtering, and the small X ray diffraction spectrum for the multilayer is measured by using X ray with the wavelength of 0.154 nm. The interfacial roughness are given by the combination of the formula with the small angle X ray diffraction spectrum, and fitting the measured spectrum to the theoretical diffraction spectrum respectively. The results show that the calculated data of the interfacial roughness from the formula is closer to that given by fitting curve, which equals the real roughness of Mo/Si multilayer.更多还原