【摘要】 在对材料光刻阈值特性进行研究的基础上,提出了一种可有效克服材料非线性特性影响,提高微透镜浮雕深度的新方法——基底曝光法。在曝光之前,对抗蚀剂整体施加一定量的曝光,提升抗蚀剂刻蚀基面。该方法可制作出面形均方根误差小于3%的微透镜阵列。更多还原

【Abstract】 On the basis of studying lithographic threshold of photoresists, a new methodpreexposure method that can effectively overcome nonlinear property and improve relief depth of micro-lens array is proposed. Before exposure process, certain amount of exposure is applied to the whole photoresist for rising base plane of photoresist. Micro-lens array with surface shape error less than 3% can be manufactured with this method.更多还原