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ZnO光电导紫外探测器的制备和特性研究

Fabrication and Properties of ZnO Photoconductive UV Detector

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【作者】 叶志镇张银珠陈汉鸿何乐年邹璐黄靖云吕建国

【Author】 YE Zhi-zhen 1,ZHANG Yin-zhu 1,CHEN Han-hong 1,HE Le-nian 2,ZOU Lu 1,HUANG Jing-yun 1,LU Jian-guo 1 ( 1.Zhejiang University State Key Lab of Silicon Material,Hangzhou,Zhejiang 310027,China; 2.Dept. of electrical engineering,Hangzhou,Zhejiang 310027,China)

【机构】 浙江大学硅材料国家重点实验室浙江大学电机系浙江大学硅材料国家重点实验室 浙江杭州310027浙江杭州310027浙江杭州310027

【摘要】 以Si(111)衬底 ,用脉冲激光沉积 (PLD)法制得C轴高度择优取向的ZnO薄膜 ,并利用剥离技术制备了ZnO光导型紫外探测器 .Al叉指状电极是由平面磁控溅射技术沉积得到的 .对Al/ZnO/Al的伏安特性和紫外光响应的研究表明 ,金属铝和ZnO能形成很好的欧姆接触 ,紫外探测器的电阻值在 10 0KΩ左右 .在紫外区域 ,其 5V偏压下的光响应度为0 .5A/W .

【Abstract】 Highly c-axis oriented ZnO thin films were deposited on single crystal Si(111)substrates by pulsed laser deposition(PLD).The photoconductive UV detectors based on ZnO thin films,being an MSM structure with interdigital(IDT)configuration,were fabricated by the desquamation photoetching method.The Al film-electrodes were deposited by planar magnetron sputtering.Results showed that the alloying temperature should be lower than 600℃.The I-V characteristic and the UV photoresponsivity of the detector were also investigated,indicating a good ohmic behavior between Al and ZnO thin film,a resistance about 100KΩ for the detector,and a photoresponsivity of 0.5A/W under ultraviolet illumination in ultraviolet region.

【基金】 国家重点基础研究专项经费“973”(No .G2 0 0 0 0 683 0 6)
  • 【文献出处】 电子学报 ,Acta Electronica Sinica , 编辑部邮箱 ,2003年11期
  • 【分类号】TN23
  • 【被引频次】135
  • 【下载频次】1242
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