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ZnO光电导紫外探测器的制备和特性研究
Fabrication and Properties of ZnO Photoconductive UV Detector
【摘要】 以Si(111)衬底 ,用脉冲激光沉积 (PLD)法制得C轴高度择优取向的ZnO薄膜 ,并利用剥离技术制备了ZnO光导型紫外探测器 .Al叉指状电极是由平面磁控溅射技术沉积得到的 .对Al/ZnO/Al的伏安特性和紫外光响应的研究表明 ,金属铝和ZnO能形成很好的欧姆接触 ,紫外探测器的电阻值在 10 0KΩ左右 .在紫外区域 ,其 5V偏压下的光响应度为0 .5A/W .
【Abstract】 Highly c-axis oriented ZnO thin films were deposited on single crystal Si(111)substrates by pulsed laser deposition(PLD).The photoconductive UV detectors based on ZnO thin films,being an MSM structure with interdigital(IDT)configuration,were fabricated by the desquamation photoetching method.The Al film-electrodes were deposited by planar magnetron sputtering.Results showed that the alloying temperature should be lower than 600℃.The I-V characteristic and the UV photoresponsivity of the detector were also investigated,indicating a good ohmic behavior between Al and ZnO thin film,a resistance about 100KΩ for the detector,and a photoresponsivity of 0.5A/W under ultraviolet illumination in ultraviolet region.
【Key words】 ZnO thin films; photoconductive UV detector; ohmic contact; photoresponsivity;
- 【文献出处】 电子学报 ,Acta Electronica Sinica , 编辑部邮箱 ,2003年11期
- 【分类号】TN23
- 【被引频次】135
- 【下载频次】1242