节点文献
WLP用喷镀装置中的匀流板优化设计
The Diffuser’s Optimum Design in Fountain-Plating for Wafer Level Package
【摘要】 喷镀式电镀已广泛应用于圆片级封装(WLP)中,电镀杯是喷镀装置中最关键的部件,杯中的匀流板又是影响电镀质量关键。对匀流板的形状和位置进行了计算机模拟和优化,并实际应用于喷镀装置中,取得了很好结果。
【Abstract】 The fountain-plating is widely used for plating in wafer level package(WLP).Plating cup is the key com ponent in the plating apparatus and the diffuser is the most important part in cup,which will greatly affect the quality.The simulation and optimization of solution flow in the cup by computational fluid dynamics(CFD)tool have been intro duced in this paper.The results have been successfully used for the machine design.
- 【文献出处】 电子工业专用设备 ,Equipment For Electronic Products Manufacturing , 编辑部邮箱 ,2003年04期
- 【分类号】TQ153
- 【下载频次】81