【摘要】 使用在连续介质中建立的二维流场数学模型,模拟计算了在用HFCVD方法生长金刚石薄膜过程中影响气体温度分布的多个沉积工艺参数,研究了气体的速度和体密度的空间分布。结果表明,在优化工艺参数条件下,高温热丝的热阻塞作用导致气体状态参数的不均匀空间分布;在热丝附近气体的速度大而靠近反应腔体侧壁处小;热丝附近处气体体密度减小而靠近冷反应腔体例壁处增加,采用绝热或高等温边界的反应腔管道壁可以消除气体的热绕流现象,有利于大面积金刚石薄膜的快速均匀生长。更多还原

【Abstract】 Numerical simulations in a 2-D mathematical model were used to investigate the influence of various deposition parameters on the gas physical parameters, which included temperature, velocity and volume density, during the growth of diamond films by HFCVD. It was found that the space distributions of gas parameters were inhomogeneous because of the thermal blockage made by hot filaments with high temperature, and even under the above deposition parameters fixed at optimal values. They would be more homogeneous if the reactor wall contains adiabatic or isothermal border with high temperature.更多还原