【摘要】 0.1um光刻机硅片台在扫描曝光过程中要求纳米级的轨迹精度,采用直线电机承担大行程粗动控制和洛沦磁电机承担高精度微动控制的复合运动能满足要求.为减小微动电机的运动范围和加速度,必须提高直线电机的位置控制精度.介绍了高精度永磁直线交流同步电机的IP位置控制算法,提出采用最优预测前馈补偿,提高实时跟踪性能,增强抗干扰能力,以满足直线电机的高速度高精度位置控制要求.更多还原

【Abstract】 A nmlevel trackerr precision is required while scanning and exposing the wafer stage of 0.1 um lithography. A complex movement can meet the requirement by using linear motor to realize the low precison long stroke and Lorentz motor to the high precision short stroke. In order to reduce the movement scope and acceleration of short stroke motor, the position control precision of linear motor must be improved. An IP control arithmetic is introduced for high precision forever magnetic AC synchro linear motor and an optimal predictive feedforward compensation method is proposed, which performs perfectly in improving the realtime tracking ability, enforcing antidisturbance ability, and meeting the requirement of highvelocity and highprecision position control of linear motor.更多还原