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衬底对铟凸点织构的影响研究
Effect of Substrate on the Texture of Indium Bumps
【摘要】 为研究衬底材料对所溅射的铟织构模式的影响,选用UBM(UnderBumpMetallization)膜、InSb单晶和无定形PR(光刻胶)3种不同衬底材料磁控溅射铟,实验对比了3种衬底材料对铟织构的影响。实验结果表明:铟的织构模式基本不受衬底材料的影响,其织构模式主要为强(101)丝织构和弱的(110)丝织构。这证明了铟的织构形成机理是典型的生长竞争机制。
【Abstract】 To study the effect of substrate materials on the texture of magnetron sputtered indium, the UBM(Under Bump Metallization) of Cr/Au film, single crystal (111) InSb and amorphous photoresist were employed as substrate materials. The results indicate that the patterns of the indium textures are almost independent of the substrate materials, and the texture components consist of a strong (101) fiber texture and a weak (110) fiber texture. The texture mode proves that the texture forming mechanism of indium is a growth competition phenomenon.
- 【文献出处】 稀有金属材料与工程 ,Rare Metal Materials and Engineering , 编辑部邮箱 ,2003年08期
- 【分类号】TN304
- 【被引频次】4
- 【下载频次】83