【摘要】 由溅射速率方程和反应粒子输运方程得出了靶面化合物的覆盖度。所有方程都用反应室结构参数和宏观参数表示。文中还给出了溅射淀积TiN薄膜的计算结果,结果表明与实验数相吻合。所建立的方法便于工艺优化的实施,属新的工程方法。更多还原

【Abstract】 The compound fraction of target surface was gotten from the rate equation s of sputtering and the transport equations of reactive particles .All of these equations are expressed by the constructional parameters of the chamber and macroscopic technology parameters.The calculating results from the TiN thin films deposited by reactive sputtering are well fit with the experim ental data.The methodes pro-vided in this paper will be benefit to the implementation of technology op timum as a new engineering methodes.更多还原