【摘要】 将采用直流磁控溅射方法制备的NiTi薄膜沉积在热的衬底上,应用X射线散射和小角X射线散射技术研究了NiTi合金薄膜中生成的晶化粒子的界面特征和晶粒大小.结果表明:衬底加热可降低薄膜的晶化温度,衬底温度在350℃以上,溅射的NiTi薄膜已部分晶化;衬底温度在350、370℃和420℃溅射的NiTi薄膜,对应的晶化粒子的半径分别是2 40、2 59、2 81nm;薄膜中的晶化粒子以形核长大的方式进行,结晶粒子与基底之间有清晰的界面.更多还原

【Abstract】 NiTi thin films were deposited on hot substrate by D.C. magnetron sputtering at substrate temperatures of 350?370 ℃ and 420 ℃, respectively, the interfacial characteristics and the size of the crystalline particles in NiTi thin films were studied using Xray diffraction (XRD) and Smallangle Xray Scattering (SAXS), and the results show that the crystallization temperature is reduced, the films deposited on substrates above 350 ℃ are partly crystallized; the sizes of crystalline particles obtained are 240 nm?259 nm and 281 nm, for substrate temperatures of 350 ℃?370 ℃ and 420 ℃ respectively;and the crystalline particles of NiTi film deposited on heated substrate have a sharp interface between crystallized and amorphous phases.更多还原