节点文献
压阻式硅微加速度计的研制
Development of piezoresistive silicon-micro-accelerometer
【摘要】 介绍压阻式硅微加速度计的结构设计。采用等离子体刻蚀技术制作成硅微加速度计。该技术具有腐蚀深宽比高、掩模选择性好的特点,适用于微机械器件的制作。通过测试,加速度计的非线性达到0.2%。讨论了影响加速度计灵敏度的结构因素和工艺因素。
【Abstract】 Structure design of piezoresistive silicon-micro-accelerometer is introduced. Silicon-micro-accelerometer is fabricated by plasma etch technology. The characters of the technology are high aspect ratio and very high mask selectivities. The technology is applied to micro-machine fabrication. Through testing, non-linearity of the accelerometer is 0.2%. Structure factor and technology factor effecting sensitivity of the accelerometer are discussed.
【关键词】 硅微加速度计;
压阻式;
MEMS;
等离子体刻蚀;
【Key words】 silicon-micro-accelerometer; piezoresistive; MEMS; plasma etch;
【Key words】 silicon-micro-accelerometer; piezoresistive; MEMS; plasma etch;
- 【文献出处】 传感器技术 ,Journal of Transducer Technology , 编辑部邮箱 ,2003年12期
- 【分类号】TH824.4
- 【被引频次】9
- 【下载频次】384