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InP-HEMT中复合沟道的设计与生长
Design and growth of composite channel of InP HEMTs
【摘要】 设计并生长了带有复合沟道的InP基HEMT材料,该材料具有较高的二维电子气浓度和迁移率。在使用InxGa1-xAs/In0.53Ga0.47As复合沟道时,当In组分等于0.7时得到较好的沟道输运性能;在使用InAs复合沟道时,得到了二维电子气浓度为2.3×1012/cm2、室温迁移率高达13600 cm2/V·s的性能优良的HEMT材料。
【Abstract】 We have designed and grown InP-based HEMT with composite channel, the materials achieve higher 2DEG density and mobility. With the use of InxGa1-xAs/In0.53Ga0.47As composite channel, the better channel conductivity is achieved at x =0.7. With the use of InAs composite channel, the corresponding electron mobility is as high as 13600cm2/V·s with 2DEG density of 2.3×10~12/cm2.
- 【文献出处】 微纳电子技术 ,Micronanoelectronic Technology , 编辑部邮箱 ,2003年03期
- 【分类号】TN405
- 【下载频次】66