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隧道二极管用锗单晶制备的温场设计

Temperature Profile Design for Ga Heavily-doped Ge Single Crystal Growth

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【作者】 韩兆忠胡国元褚乃林杨海

【Author】 Han Zhaozhong, Hu Guoyuan, Chu Nailin and Yang Hai(General Research Institute for Nonferrous Metals, Beijing 100088, China)

【机构】 北京有色金属研究总院

【摘要】 通过设计合适的温场,解决了重掺单晶生长过程中的组分过冷和位错密度高的问题,获得了高掺杂浓度高迁移率的无位错单晶。

【Abstract】 Proper temperature profile was designed to solve the problems of heavilydoped Germanium single crystal growth. High temperature gradient in the melt near the solid-liquid interface was required to prevent constitution supercooling, and lower temperature gradient in the crystal was obtained at the same time to decrease dislocations. High Hall mobility and freedislocation single crystal were obtained.

【关键词】 温场单晶重掺
【Key words】 Temperature profileHeavilydopedGermaniumSingle crystal growth
  • 【文献出处】 稀有金属 ,CHINESE JOURNAL OF RARE METALS , 编辑部邮箱 ,1998年02期
  • 【分类号】O782.9
  • 【下载频次】56
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