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Φ200mm硅单晶的生长工艺特点

Growth Characteristics of Φ 200 mm Silicon Single Crystal

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【作者】 张果虎常青方锋吴志强周旗钢

【Author】 Zhang Guohu, Chang Qing, Fang Feng, Wu Zhiqiang and Zhou Qigang (General Research Institute for Non ferrous Metals, Beijing 100088, China)

【机构】 北京有色金属研究总院

【摘要】 在全自动拉晶条件下,讨论了拉制Φ200mm硅单晶遇到的新问题。热场配置、工艺参数的选择、石英坩埚的选用等有了更严格的要求。合理的轴向温度梯度和径向温度梯度、低拉速、低晶转及规范的拉晶工艺是拉制大直径单晶的关键。

【Abstract】 Problems of large diameter single crystal growth using sophisticated equipment were discussed. Man made interference was reduced since the automatic crystal growth equipment was applicated, but the hot zone design, process paramter selection and the high quality of quartz crucible become more important. It indicates that appropriate temperature gradient (both axial and radial), lower pulling rate and lower seed rotation rate are cruxes of Φ 200 mm silicon single crystal growth.

  • 【文献出处】 稀有金属 ,CHINESE JOURNAL OF RARE METALS , 编辑部邮箱 ,1998年01期
  • 【分类号】TN304.120.53
  • 【被引频次】10
  • 【下载频次】174
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