【摘要】 本实验用对向靶溅射仪分别在Si（100），NaCl单晶衬底上成功地制备出具有高炮和磁化强度的（Fe，Ti）－N薄膜，研究了氮气分压和衬底温度对薄膜结构与磁性的影响。氮气分压为0．04～0．07Pa，衬底温度为100～150℃时，有利于Fe₁₆N₂相的形成，在此条件下制备的（Fe，Ti）－N薄膜的饱和磁化强度为2．3～2．46T，超过纯Fe的饱和磁化强度值。更多还原

【Abstract】 In this study,the （Fe,Ti）-N then films with high saturation magnetization were grown on Si（100） and NaCl single crystal substrates by facing targets sputtering. X-ray diffiactometer and transimission electron microscope were used to investigate the influence of nitrogen gas pressure and substrate temperature on the sturctures and magnetic proper-ties of （Fe,Ti）-N films.When p_N2 = 0.04～0.07 Pa and T₈ = 100¹50℃,it is advantageous to form Fe₁₆N₂ phase.The saturation magnetization of the（Fe, Ti）-N films deposited under these conditions was 2. 3 2.46 T, which is larger than that of pure iron.更多还原