【摘要】 对Ar气氛下射频溅射所镀铬钼合金膜，采集不同组分配比的俄歇电子能谱，经平滑、扣除本底处理，得出随铬钼相对比例改变的变化规律。根据俄歇电子跃迁的准原子模型，对谱峰进行曲线拟合，得出铬钼合金膜并非铬钼的单纯机械混合，其外层电子发生了某种转移，利用高斯曲线对所得俄歇谱拟合后，对每个俄歇峰按成分比进行面积归一化，细致分析后得出钼的N₂₃轨道电子数增多，钼的M₄₅，N₁，N₂₃和价带发生变化及移动，并且有一些3d电子从Cr转移到Mo的4d轨道上。而且运用带非负约束的退卷积和退自卷积等新的分析方法，首次利用AES获得了几种不同配比CrMo合金膜的价带态密度分布。更多还原

【Abstract】 Auger spectra for CrMo films with different stoichiometric are studied. After smoothing and baseline re-moval of the Auger integral spectra, the changes of the Auger line shape with the contents of Cr and Mo are drawn. In ac-cordance with the quasi-atomic model of the Auger transtion, the result of curve fitting shows that Cr and Mo are no sim-ply mixed together to form the CrMo films, there are some electron transfers between Cr and Mo. Using Gaussian functionto fit the curves and with are normalization to each Auger peak with respect to the contents of Cr and Mo, careful analysisdemonstraes that the density of states（DOS） of Mo N₂₃ level increases and the orbital levels of Mo M₄₅, N₁, N₂₃ and the valence band of Mo vary and shift. And there are some 3d electrons of Cr transferring to 4d orbital of Mo. In addition,with the analytical methods of non-negative limit de-convolution and de-selfconvolution, the distribution of the DOS of the valence band for several CrMo alloy films are obtained.更多还原