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p-Si上激光诱导局部沉积铂

Laser-Induced Partial Deposition of Pt on p-Silicon Wafers

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【Author】 Cui Qiming; Jiang Zhiyu; Yu Zuzhan(Department of Chemistry,Fudan University,Shanghai 200433)Ying Zhifeng(Department of Physics,Fudan University,Shanghai)

【机构】复旦大学化学系!上海； 200433；复旦大学物理系!上海；

【Abstract】 The partial deposit films on p-silicon wafers were formed from three kinds of plating solution: chloro-platinic acid, potassium tetranitroplatinate and diammine platinium dinitrate under Nd: YAG laser irradiation. The compositions and properties of the depositswere investigated by AES, SEM and XPS techniques. The Pt deposits have ohmic contactwith p-type silicon.更多还原

【关键词】电镀铂；激光诱导沉积； p－Si；
【Key words】 platinium plating； laser induced deposition； p-silicon；

【文献出处】应用化学 ,CHINESE JOURNAL OF APPLIED CHEMISTRY , 编辑部邮箱 ,1998年04期

【分类号】O614
【被引频次】2
【下载频次】53

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