【摘要】 研究用热灯丝化学气相沉积（ＨＦＣＶＤ）法在Ｍ０衬底上生长多晶金刚石膜。实验研究表明，负偏压对金刚石膜生长的影响十分显著，这是负偏压极大地影响了金刚石的核密度引起的，研究表明，来自金刚石的发射电子对气体分子的撞击，加速了ＣＨ４、Ｈ２分子离化，在衬底表面附近形成了一等离子体区，使Ｍ０衬底上金刚石的核密度可达１０９ｃｍ－２更多还原

【Abstract】 In this paper,the growth of polycrystalline diamond films on M 0 substrate by HFCVD was studied. The experimental results showed that the negative substrate bias has a significant effect on the growth of diamond films. This is due to that nucleation density was greatly enhanced by negative bias. The studies indicated that the electrons from diamond coatings collide with reactive gas molecules and accelerated CH 4 and H 2 to be decomposed, igniting a plasma region near the substrate surface, and led to high nucleation density of diamond on M 0 substrate to be over 10 10 cm -2 。更多还原