【摘要】 本文介绍了应用于亚微米电子束曝光机电源系统中的ＦＩＲ滤波器。在高稳定状态下提供严格的线性相位特性，使系统指标确保了０．１μｍ束斑的精度要求。更多还原

【Abstract】 The FIR filter used in the power supply of submicron E beam lithography system is described. It offers good linear phase characteristic with high stability,which ensure the system to have the precision 0.1μm of the beam spot.更多还原