节点文献
镓液态金属离子源的制备
FABRICATION OF GA LIQUID METAL ION SOURCE
【摘要】 镓液态金属离子源广泛应用于聚焦离子束技术 ,本文介绍了一种利用电子轰击的方法制备镓液态金属离子源的工艺和设备 ,测试了源的 I- V发射特性曲线 ,d I/ d V≈ 0 .0 5 ( μA/ V) ,进行了新旧工艺下电流发射稳定度的比较 ,最佳源发射稳定度大于 95 % ,寿命大于 1 0 0 0小时。
【Abstract】 Ga liquid metal ion source(LMIS) is often used in focused ion beam technique. In the paper, An electron bombardment process and the corresponding experimental equipment for Ga LMIS’s fabrication are introduced. The source’s emitting characteristic is tested, dI/dV≈0.05(μA/V). The emitting stability of the source fabricated by the new process is compared with that by the old process .The best stability is more than 95% and the source’s lifetime is more than 1000 hours。
【关键词】 液态金属离子源;
聚焦离子束;
微细加工;
【Key words】 liquid metal ion source; focused ion beam; micro fabrication;
【Key words】 liquid metal ion source; focused ion beam; micro fabrication;
- 【文献出处】 微细加工技术 ,MICROFABRICATION TECHNOLOGY , 编辑部邮箱 ,1998年03期
- 【分类号】TN405
- 【被引频次】14
- 【下载频次】126