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K/GaAs(100)表面的氮化

NITRIDATION OF K/GaAs(100) SURFACES

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【作者】 胡海天来冰袁泽亮丁训民侯晓远

【Author】 *Project supported by the National Natural Science Foundation of China and Shanghai Science and Technology Commission. HU HAI TIAN LAI BING\ YUAN ZE LIANG DING XUN MIN HOU XIAO YUAN (State Key Laboratory of Surface Physics, Fudan Univ

【机构】 复旦大学应用表面物理国家重点实验室

【摘要】 K吸附层的存在能促进GaAs(100)表面在室温下的氮化.光电发射测量为此提供了证据.在将K/GaAs(100)暴露于纯氮以后,价带和芯能级谱均会出现显著变化:功函数有一定程度回升,价带谱中显露N2p峰,Ga2p和As2p芯能级谱中产生化学位移分量.就所研究的三种不同的K覆盖度(1/4,1/2和1ML)而言,1ML的那种显示了最强的促进作用.

【Abstract】 Abstract Presence of a K adlayer will promote nitridation of GaAs(100) surfaces at room temperature, as is evidenced by photoemission measurements. Following exposure of K/GaAs to pure nitrogen, there appear remarkable variations in both valence band and core level spectra, i.e., recovery of work function to a certain extent, emergence of the N2p peak in the valence band spectra and creation of chemically shifted Ga2p and As2p components in the core level spectra. For the three different K coverages we studied (1/4, 1/2 and 1ML), the 1ML one shows the strongest promotion effect.

【基金】 国家自然科学基金,上海市科学技术委员会资助
  • 【文献出处】 物理学报 ,ACTA PHYSICA SINICA , 编辑部邮箱 ,1998年06期
  • 【分类号】TN305.2
  • 【下载频次】30
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