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铝基离子镀氮化物膜的研究

Research of Depositing TiN and (TiCrFe)N Films on Aluminum Substrate by Multi Arc Ion Plating

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【作者】 李瑜煜谢致薇朱有兰许卫铭

【Author】 Li Yuyu,Xie Zhiwei,Li Qiaoshen,Zhu Youlan,Xu Weiming (Department of Material,Guangdong University of Technology,Guangzhou 510090)

【机构】 广东工业大学材料系

【摘要】 探讨了在铝及铝合金基体上离子镀TiN薄膜的可行性,研究了各工艺因素和掺入微量Cr、Fe对TiN膜质量及性能的影响,同时还研究了铝基离子镀TiN薄膜的最佳工艺条件。结果表明,在铝合金基体上离子镀TiN薄膜是可行的。

【Abstract】 It was studied in the paper that the feasibility of depositing TiN and (TiCrFe)N films on aluminum substrate by multi arc ion plating,and it was studied also that the quality and property of the films was influenced by various technological factors and mixing into the trace amount of Cr and Fe The optimum technological conditions were given It was proved by the research result that depositing TiN films was feasible on aluminum substrate by multi arc ion plating

【关键词】 离子镀TiN膜铝基体
【Key words】 ion platingTiN filmaluminum substrate
  • 【文献出处】 金属热处理 ,HEAT TREATMENT OF METALS , 编辑部邮箱 ,1998年10期
  • 【分类号】TG156.8,TG156.8
  • 【被引频次】7
  • 【下载频次】52
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