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多弧离子沉积(TiFeCr)N多元膜

(TiFeCr)N Films Deposited by Multi arc Ion Plating

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【作者】 谢致薇李瑜煜林松盛陈海燕谢光荣黄小平

【Author】 Xie Zhiwei,Li Yuyu,Li Qiaoshen,Lin Songsheng,Chen haiyan,Xie Guangrong,Huang Xiaoping (Department of Material Science and Engineering,Guangdong University of Technology,Guangzhou 510090)

【机构】 广东工业大学材料系

【摘要】 研究了多弧离子沉积(TiFeCr)N多元膜的性能,并与同一设备下沉积TiN膜的性能进行比较。结果表明,(TiFeCr)N多元膜的力学性能和耐蚀性能均优于TiN膜。定量金相分析结果表明,(TiFeCr)N多元膜的孔隙度比TiN膜低得多。文中对多元膜的强化机理进行了讨论,认为孔隙度降低是使多元膜性能大幅度提高的主要原因。

【Abstract】 TiFeCr)N films are deposited by multi arc ion plating and the properties are studied.The results show that the mechanical properties and the corrosion resistance of (TiFeCr)N films are significantly higher than those of TiN films,that the porosity of (TiFeCr)N is much lower than that of TiN.The reasons of improvement on properties of the multi component films are also discussed.The lower porosity is thought to be one of the main reasons

  • 【文献出处】 金属热处理 ,HEAT TREATMENT OF METALS , 编辑部邮箱 ,1998年09期
  • 【分类号】TB43
  • 【被引频次】36
  • 【下载频次】82
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