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In+离子注入蓝宝石(α-A12O3单晶)的表面改性研究
Surface modification of sapphire implanted with indium ions
【摘要】 研究了<0001<和<1210>晶向蓝宝石(α-Al2O3单晶)在注入360keV.1×10 ̄16cm ̄-2或100keV、6×10 ̄16cm ̄-2的In ̄+后产生的损伤、注入层的性能变化和退火行为。实验结果表明,退火过程中损伤的恢复和In的分布与退火气氛有关:在100keV、6×10 ̄16cm ̄-2的In ̄+注入时,注入层电阻率降低了10个量级,大小为6.8×10 ̄3·cm,表面损伤层的显微硬度提高了92%;在360keV,1×10 ̄16cm ̄-2的In+注入时,其表面损伤层的显微硬度提高了45%,在空气中不同温度下退火后,其显微硬度的变化和损伤的变化具有相同的规律。
【Abstract】 Single crystals of sapphire (α-Al2O3) implanted with 100keV, 6×1016cm-2 (In+) or 360keV, 1×1016cm2 (In+) have been studied. The implantation was carried out at room temperature but the annealing was performed isothermally in Ar or air atmosphere at temperature in the range from 600℃ to 1100℃ The Rutherford backscattering spectrometry and channeling of 2.4MeV He+ were used to observe the depth distribution of lattice damage and implants. The microhardness and resistivity of the implanted layer were investigated by means of the depth-sensing low-load indentation technique and the electrical conductivity measurement, respectively. Results on the structural changes are correlated with the measured changes of physical properties.
【Key words】 Ion implantation; Sapphire; Lattice damage; Surface modification;
- 【文献出处】 核技术 ,NUCLEAR TECHNIQUES , 编辑部邮箱 ,1998年09期
- 【分类号】TN305.3
- 【被引频次】4
- 【下载频次】83