【摘要】 介绍了正在现场使用的亚微米电子束曝光机激光工件台系统，详细论述了它的技术特征，分析了影响重复测量精度的误差因素，给出了系统各部分实际检测达到的技术指标。更多还原

【Abstract】 A laser stage system for sub micron E beam exposure machine which is being applied in the field at present is introduced in the paper.Its technical characteristics are described in detail,the error factors affecting the repeated measuring accuracy are analyzed,the technical specifications which have been attained in practical testing are given.更多还原