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透明导电膜及靶材
Transparent conductive film and target material
【摘要】 透明导电膜在电气及光学领域的应用日益广泛。近年来以掺杂Sn的In2O3(简称ITO)开发和应用受到重视。用ISO靶通过溅射法制备ITO透明导电膜。由金属铟制取氧化铟粉末,后与氧化锡混合、压制烧结制出相对密度达95%的ITO靶材。
【Abstract】 Transparent conductive film is widely used in the electrical and optical engineering fields Recently, In 2O 3 doped with Sn(ITO) become more and more popular ITO is prepared with ISO target and sputtering technology Target material of ITO with a density of 95% can be acquire by means of mixing the In 2O 3 powder made from In with SO 2, pressing and firing (12 refs )
【关键词】 透明导电膜;
靶材;
Sn掺杂In2O3;
【Key words】 transparent conductive film; target material; In 2O 3 doped with Sn;
【Key words】 transparent conductive film; target material; In 2O 3 doped with Sn;
- 【文献出处】 电子元件与材料 ,ELECTRONIC COMPONENTS $ MATERIALS , 编辑部邮箱 ,1998年01期
- 【分类号】TM201.43
- 【被引频次】95
- 【下载频次】456