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镀锌及低铬钝化锌镀层的电化学行为

Electrochemical Study on Corrosion Resistance of Zinc Deposit and Low Chromating Film

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【作者】 庄菁蒋雄

【Author】 ZHUANG Jing;JIANG Xoing

【机构】 中山医科大学化学教研室!510089

【摘要】 本文在3%NaCl溶液中采用线性极化及交流阻抗技术测定了镀锌层和钝化后的锌镀层的极化电阻,实验表明:低铬钝化后腐蚀电阻明显增大,是纯锌的2~6倍,同时利用Stem-Geary方程,根据极化电阻Rp和Tafel斜率计算腐蚀电流,同时探讨了钝化后的镀锌层在静止电位下的交流抗行为。

【Abstract】 Corrsion resistance of zinc deposit and chromated zinc electrodeposit was evaluated in 3% NaCl solution by linear polarization and AC impedance method. The low chromating film had ed corrosion resistance, being 2~6 times higher than that of pure zinc plate. Based on the data of Rp as well as Tafel slopes, the corrosion current were calculated according to stem-Geary equation. The particularity of the impedance behaviour of chromated zinc was discussed.

  • 【文献出处】 电镀与涂饰 ,ELECTROPLATING & FINISHING , 编辑部邮箱 ,1998年03期
  • 【分类号】TQ153.15
  • 【被引频次】8
  • 【下载频次】169
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