【摘要】 本文介绍了用射频溅射技术制备InSb薄膜的方法,探索了溅射电压,工作气压、衬底温度及基片电压等条件对膜的特性和结构的影响.着重讨论了溅射条件对膜方块电阻的影响,并初步得出其变化规律.更多还原

【Abstract】 This paper introduces the fabrication of InSb thin films using RF sputtering. The effect of sputtering conditions such as the voltage of sputtering, the voltage of substrate, substrate temperature and sputtering pressure on the properties and structures of InSb thin films are detected. Through experiments, it describes in detail the effect of sputtering conditions on the sheet resistance of Insb thin films, and the law of it is preliminarily given更多还原