【摘要】 本文简述了干法刻蚀的现状和Ｍｕｌｔｉｐｌｅｘ － ＩＣＰ 的结构原理， 给出了高纵横比微孔列阵的初刻实验结果， 并对有关参数进行了初步讨论更多还原

【Abstract】 The present status of dry etching the structure and principle of Multiplex ICP were introduced in this paper.The primary experiment results on high aspect radip of the micro hole array were obtained.Finally,we discussed the geometric and processing parameters of the deep hole microchannel array prepared by ICP.更多还原