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退火处理对氧化锌透明导电膜的结构及电学特性的影响

Affect of Heat Treatment on Structure and Electrical Properties of Zinc Oxide Films

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【作者】 马瑾; 计峰; 李淑英; 马洪磊;

【Author】 Ma Jin, Ji Feng, Li Shuying, Ma Honglei(Institute of Optoelectronic Materials and Devices, Shandong University, Jinan 250100)

【机构】 山东大学光电材料与器件研究所;

【摘要】 采用真空蒸发技术,以醋酸锌和氯化铝作为蒸发物质,在加热的玻璃衬底上制备出氧化锌和铝掺杂的氧化锌透明导电薄膜.研究了氢气、空气和真空退火处理对制备薄膜的结构及电学性能的影响

【Abstract】 Abstract Un doped and aluminium doped zinc oxide films were prepared by evaporation of zinc acetate and aluminium chloride onto heated glass substrate. The affect of heat treatment in air, hydrogen gas and vacuum on the structure and electrical properties of the films are studied.Heat treatment in hydrogen gas and vacuum significantly decreases the resistivity of these ZnO films by more than five or six orders of magnitude.This behavior can be understood in terms of a grain boundary trapping model.

  • 【文献出处】 半导体学报 ,CHINESE JOURNAL OF SEMICONDUCTORS , 编辑部邮箱 ,1998年06期
  • 【分类号】O484,TN304.905.5
  • 【被引频次】12
  • 【下载频次】273
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