节点文献
反应溅射制备TiN薄膜的靶动力学研究
STUDY ON TARGET KINETICS IN TIN THIN FILMS PREPARED BY REACTION SPUTTERING
【摘要】 从微观粒子的相互作用和输运出发,探讨靶溅射过程中的基元化学物理步骤,计算了溅射速率和离子能量分布,为深入研究溅射薄膜的生长速率和靶中毒奠定基础。
【Abstract】 The elementary chemicophysical processes are studied by the micro-particles in-teraction and transportation, and the sputtering rate and energy distribution of theions are also calculated. The results give the basis for further studies of the growingrate of sputtering thin film and the target poisoning.
【基金】 国家自然科学基金
- 【文献出处】 微细加工技术 ,MICROFABRICATION TECHNOLOGY , 编辑部邮箱 ,1997年01期
- 【分类号】TN304
- 【被引频次】4
- 【下载频次】90