节点文献
高温氧化薄膜应力的测定
Analysis and Measurment of High Temperature Oxide Thin film Stress
【摘要】 介绍一种高温氧化薄膜应力的测定技术,它能在一定高温氧化条件下原位测定氧化膜中的生长应力,在某一温度变化范围内原位测定氧化膜中的热应力.这种技术可在普通衍射仪上进行
【Abstract】 A measuring technique of high temperature oxide thin film stress is introduced. The growth stresses of the oxide thin film can be measured on the condition of the constant high temperature oxidation and the thermal stresses can be measured within the variations of a certain temperature. The measuring technique can be carried out with an ordinary diffractometer.
【基金】 国家自然科学基金,华东分析测试中心测试基金
- 【文献出处】 上海交通大学学报 ,JOURNAL OF SHANGHAI JIAOTONG UNIVERSITY , 编辑部邮箱 ,1997年01期
- 【分类号】TG115.23
- 【被引频次】4
- 【下载频次】150