【摘要】 本文报道了用于半导体光刻的一体化小型KrF准分子激光器及光学系统的性能。获得了16mm×40mm的均匀光斑，光强分布不均匀性＜±5％光密度～1mJ／cm2。最后讨论了改善微区均匀性的方法。更多还原

【Abstract】 篈 small KrF excimer laser and optical system for optical etching is developed.The16 mm×40 mm homogeneous laser beam is obtained with intensity inhomogeneity< ±15%and density 1 mJ/cm2. The means of improving micro-region homogeneity is discussed更多还原