【摘要】 采用划痕法测定了离子束增强沉积ＴｉＮ薄膜的界面结合力。结果表明，由于在离子束增强沉积过程中ＴｉＮ薄膜和基体之间生成一层厚约３０～４０ｎｍ的过渡层，从而大大改善了涂层的界面结合强度，其临界载荷可达１４０Ｎ，为一般ＰＶＤ和ＣＶＤ方法所生成的ＴｉＮ膜的３～４倍，并且发现它并不随膜厚的增加而变化。更多还原

【Abstract】 In this work,the scratch test has been used to measure the adhesion of TiN films prepared by ion beam enhanced deposition.It is found that the interfacial bonding strength of TiN films can be significantly improved by IBED because there is transition layer with about 30 to 40nm between coating and substrate during the films deposition process.The critical load obtained on TiN film by the scratch test has been risen up to 140N,that is 3 to 4 times of that of TiN films formed by general PVD and CVD,and it doesn’t increase with the coating thickness.更多还原