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微透镜列阵的离子束刻蚀及衍射效率测量
Ion Beam Etching of Binary Optics Microlens Arrays and the Test of Diffraction Efficiency
【摘要】 采用Kaufman离子源刻蚀微透镜列阵并采用实时检测系统对刻蚀深度进行了控制。提出了测量微透镜列阵衍射效率的一种方法。对测量误差进行了讨论。
【Abstract】 A binary optics microlens array (BM) was fabricated by using ion beam etching. The real-time test of etching depth in vacuum enviroment was performed. A noval method of measuring the BM diffraction efficiency was presented.
- 【文献出处】 中国激光 ,Chinese Journal of Lasers , 编辑部邮箱 ,1997年01期
- 【分类号】TN305
- 【被引频次】8
- 【下载频次】91