【摘要】 采用正交试验法对ＰＣＶＤ等离子体增强化学气相沉积渗硅的工艺进行了优化。在４０％ＳｉｎＨ２ｎ＋２＋６０％Ａｒ（质量分数）渗硅源中，电工钢于４８０℃ＰＣＶＤ处理４０ｍｉｎ，其表面可形成厚２０μｍ富硅层。再经１１００℃扩散１ｈ，电工钢铁损下降４９．５％，Ｂ２５００提高６５％，电磁性能得到极大的改善。更多还原

【Abstract】 Orthogonal test is used to optimize the PCVD process for producing high silicon steel. The electric steel is PVCD treated at the optimal parameters: using siliconzing source of 40 %Si nH 2n+2 +60 %Ar at 480 ℃ for 40 min. The treated steel has a 20 μm thick Si enriched layer on its surface. After annealing in an atmosphere of H 2 at 1 100 ℃ for 1 h, its core loss is reduced by 49.5 % and the magnetic induction intensity is increased by 65 %. There fore, the electromagnetic properties of the electric steel can be dramatically improved.更多还原