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石墨炉原子吸收法测定饮料中硒
THREE DIMENSIONAL MICROANALYSIS OF ARSENIC IMPURITY IN SILICON
【摘要】 本文采用Pd(NO3)2-TritonX-100作硒的改进剂,使Se的允许灰化温度提高到1200℃,吸光度提高到2.92倍。用塞曼效应校正背景,有效地克服,P和Fe等的光谱干扰。此法检测限为8.0ng/mL,线性范围为10—120ng/mL,线性相关系数为r=0.9931。
【Abstract】 The three dimensional distribution of arsenic impurity concentration on the silicon wafer surface is determinaed by means of synchrotron radiation X ray microfluorescence (SRXRF) and total reflection X ray fluorescence (TXRF) anslysis.The result of depth profile of As is checked with secondary ion mass spectrometry(SIMS)and the agreement is reasonably good.
【关键词】 石墨炉原子吸收;
饮料;
硒;
【Key words】 Synchrotron radiation; Total reflection; Three dimensional distribution;
【Key words】 Synchrotron radiation; Total reflection; Three dimensional distribution;
- 【文献出处】 光谱学与光谱分析 ,SPECTROSCOPY AND SPECTRAL ANALYSIS , 编辑部邮箱 ,1997年04期
- 【分类号】O657.31:O653
- 【被引频次】16
- 【下载频次】83