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电子束蒸发法制备Co/Cu多层膜中巨磁电阻效应的研究

INVESTIGATION OF GIANT MAGNETORESISTANCE IN Co/Cu MULTILAYERS FABRICATEDBY ELECTRON BEAM EVAPORATION

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【作者】 沈鸿烈沈勤我严健生沈德芳邹世昌

【Author】 SHEN Honglie, SHEN Qinwo, YAN Jiansheng, SHEN Defang and ZOU Shichang (State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Metallurgy, Chinese Academy of Sciences, Shanghai 200050)

【机构】 中国科学院上海冶金研究所信息功能材料国家重点实验室

【摘要】 研究了超高真空电子束蒸发法制备的Co/Cu多层膜中过渡层Cr、磁性金属Co层和非磁性金属Cu层厚度等对巨磁电阻效应的影响。结果表明:适当的Cr过渡层厚度有利于获得大的巨磁电阻效应,但过渡层太厚时由于其分流效应又导致巨磁电阻效应减小;通过优化Co和Cu层厚度,单个Co/Cu/Co三明治结构中巨磁电阻效应可达7%;适当增加重复周期后,可获得室温下饱和磁场小于250Oe,巨磁电阻效应值达11%的Co/Cu多层膜结构,其热稳定性高于400℃。

【Abstract】 The effect of thickness of Cr buffer layer, Co magnetic layer and Cunonmagnetic layer on the giant magnetoresistance (GMR) in Co/Cumultilayers fabricated by UHV electron beam evaporation was studied It has been shown that optimized thickness of the Cr buffer layer is necessary to obtain high GMR value But very thick Cr buffer layer would result in a reduction of GMR value due to its shunting effect By optimization of the thickness of Co and Cu layers, a GMR value as large as 7 % was found in a single Co/Cu/Co sandwich structure By increasing stacking number to 6, a maximum GMR value of 11 % at room temperature has been obtained with a saturation field of 250 Oe in Co/Cu multilayers, which is thermally stable up to 400℃

【基金】 上海市应用材料研究与发展基金
  • 【文献出处】 功能材料与器件学报 ,JOURNAL OF FUNCTIONAL MATERIALS AND DEVICES , 编辑部邮箱 ,1997年04期
  • 【分类号】TM271
  • 【被引频次】9
  • 【下载频次】153
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