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金刚石薄膜机械抛光的研究

STUDY ON MECHANICAL POLISHING OF DIAM0ND FILM

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【作者】 王德政周克崧韩培刚冯碧洸代明江

【Author】 WANG Dezheng, ZHW Kesong, HAN Peigang, FENG Biguang, DAI Mingjang(Guangzhou Research Institute of Non-Ferrous Metals)(Manuscript received 26 June, 1996)

【机构】 广州有色金属研究院!广州510651广州有色金属研究院

【摘要】 叙述了金刚石薄膜在大气中和在会有少量氢的真空条件下的机械抛光方法.金刚石薄膜在常温的空气中进行机械抛光时,70h后金刚石薄膜的表面粗糙度由Rz=7.79μm降为Rz=0.43μm.在真空下加入少量氢气;当温度为800℃时,其抛光速率由低温的0.07μm/n上升到0.12μm/h,被抛光的表面粗糙度可达到0.01μm.

【Abstract】 Diamond films synthesized by DC plasma jet CVD have been mechanicallypolished in air and under vacuum with the addition of a little amount of H2. It is found thatin air, the surface roughness of the diamond film has been dropped to Rz=0. 43μm from theoriginal Rz=7. 79μm after polishing for 70h. However, under vacuum with the addition of alittle amount of H2, the surface roughness of the diamond film can be polished to Rz=0. 01μmat 800℃ and the polishing rate can be increased to 0. 12μm/h from Rz= 0.07μm/h at lowtemperature.

【关键词】 金刚石薄膜机械抛光
【Key words】 diamond filmmechanical polishing
【基金】 中国有色金属工业总公司高科技研究课题
  • 【文献出处】 广东有色金属学报 ,JOURNAL OF GUANGDONG NON-FERROUS METALS , 编辑部邮箱 ,1997年01期
  • 【分类号】TN305
  • 【被引频次】6
  • 【下载频次】110
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