【摘要】 叙述了金刚石薄膜在大气中和在会有少量氢的真空条件下的机械抛光方法．金刚石薄膜在常温的空气中进行机械抛光时，70h后金刚石薄膜的表面粗糙度由Rz=7.79μm降为Rz=0.43μm．在真空下加入少量氢气；当温度为800℃时，其抛光速率由低温的0．07μm／n上升到0．12μm／h，被抛光的表面粗糙度可达到0．01μm．更多还原

【Abstract】 Diamond films synthesized by DC plasma jet CVD have been mechanicallypolished in air and under vacuum with the addition of a little amount of H2. It is found thatin air, the surface roughness of the diamond film has been dropped to Rz=0. 43μm from theoriginal Rz=7. 79μm after polishing for 70h. However, under vacuum with the addition of alittle amount of H2, the surface roughness of the diamond film can be polished to Rz=0. 01μmat 800℃ and the polishing rate can be increased to 0. 12μm/h from Rz= 0.07μm/h at lowtemperature.更多还原