节点文献
激光直写系统中的对准技术应用研究
The Application Research on the Alignment Technique in the Laser Direct Write System
【摘要】 基于ＩＳＩ－２８０２型激光直写系统原有基片的多图形对准方法，针对衍射光学元件（ＤＯＥ）图形的特点，通过设计合理的对准标记、修改对准识别文件和实验，产生了一套适于ＤＯＥ图形套刻的对准方案。其对准误差小，达到了系统规定指标。并实验研制出了１６位相台阶的ＤＯＥ，取得了良好的效果。
【Abstract】 Based on the original multi pattern alignment method of substrate and against the characteristics of the patterns of diffraction optical elements,an alignment method which is suitable for DOE(diffraction optical elements)pattern overlapping precision is generated on the basis of Model ISI 2802 laser direct write system through the reasonable alignment marks designing and experiments.Its alignment error is small and has reached the stipulated specifications.The diffraction optical elements with 16 phase steps have been developed and good effects have been achieved.
【关键词】 衍射光学元件；
激光光刻机；
激光直写；
精密定位；
对准精度；
【Key words】 Diffractive optical elements； Laser photoetching machines； Laser direct write； Precision positioning； Alignment accuracy.；
【Key words】 Diffractive optical elements； Laser photoetching machines； Laser direct write； Precision positioning； Alignment accuracy.；
【基金】 微细加工光学技术国家重点实验室基金
- 【文献出处】 光电工程 ,OPTO-ELECTRONIC ENGINEERING , 编辑部邮箱 ,1997年S1期
- 【分类号】TN305.7
- 【被引频次】1
- 【下载频次】159