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表面的高分辨电子显微平面像的模拟

Simulation for HREM Plan view Imaging of Surface Structure

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【作者】 李树有关若男李日升叶恒强

【Author】 Li Shuyou\ Guan Ruonan\ Li Risheng\ Ye Hengqiang (Laboratory of Atomic Imaging of Solids, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110015, China)

【机构】 中国科学院金属研究所固体原子像开放研究实验室

【摘要】 本文全面讨论了多层法用于表面的高分辨电子显微平面像模拟计算中的各种影响因素以及需要注意的技术细节。包括光阑大小、欠焦量、样品厚度、色差与束发散度、吸收系数等的影响,为今后进一步利用这种方法在原子水平上对表面结构进行观测提供了有用的结果

【Abstract】 In this paper, the role of some critical factors in multislice simulation for surface plan view imaging, including aperture size, defocus, chromatic aberration and beam divergency, sample thickness and absorption coefficient, were fully discussed. As an example, the optimum values of these parameters for the plan view image simulation of Cu(110) (2×1)O surface reconstructure were presented. The present discussions will be helpful for the application of plan view imaging technique to further investigaiton of the surface structure and surface reaction at the atomic level.

  • 【文献出处】 电子显微学报 ,JOURNAL OF CHINESE ELECTRON MICROSCOPY SOCIETY , 编辑部邮箱 ,1997年03期
  • 【分类号】TN16
  • 【被引频次】2
  • 【下载频次】88
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