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多孔硅形貌的观测与生长机理分析
The Morphology and Formation Mechanism of Porous Silicon
【摘要】 本文在实验基础上,对多孔硅的形成形貌学进行了研究。用日立S-750型扫描电镜观测了不同条件下生长的多孔硅的正面和侧面孔的形貌。对得到的实验结果进行了较为详细的分析,为进一步研究多孔硅在半导体器件方面的应用提供了一定的基础
【Abstract】 The formation and topography of porous silicon was studied based on experiments.The topography of top view and lateral view of holes of porous silicon grown under different conditions was observed,by using Hitachi S 750 SEM.The experimental results are useful for further research on the application of porous silicon to the semiconductor device.
【关键词】 多孔硅;
阳极氧化;
Schottky势垒;
量子限制效应;
【Key words】 porous silicon anodization Schottky barrier quantum confinement effect;
【Key words】 porous silicon anodization Schottky barrier quantum confinement effect;
- 【文献出处】 电子显微学报 ,JOURNAL OF CHINESE ELECTRON MICROSCOPY SOCIETY , 编辑部邮箱 ,1997年01期
- 【分类号】TN304.12
- 【被引频次】5
- 【下载频次】90