【摘要】 采用直流溅射方法制备了厚度小于0.1μm的NiOx薄膜，研究薄膜的加热氧化及其光电特性，测量了它们的透射光谱和电阻率随薄膜中的氧含量及热处理温度的变化更多还原

【Abstract】 The thin films of NiOx, which thickness smaller than 0.1μm,were prepared by reactive sputtering of a Ni target with a mixed gas of argon and oxygen. The samples then were heated in air. It was found that the transmissivity and conductivity of the samples markedly changed with the heated temperature.According to the XRD partten these changes are due to the phase transition from metal to oxide, but also related to the crystallinity of the films. The relationship of the phase transition with the heated temperature and the oxygen content of the samples are discussed.更多还原